Ammonia
Argon
Boron Trichloride
Chlorine
Compressed Air
Fluoroform
Liquid Nitrogen
Nitrogen
Nitrous Oxide
Oxygen
Silane
Sulfur Hexafluoride
Tetrafluoromethane
Trifluoromethane
Acetone
Aluminum Etchant
Ammonium Hydroxide
Ammonium Persulfate
Anisole
AZ 300 MIF Developer
AZ 400K Developer
AZ 4620 Photoresist
AZ 5214-E Photoresist
AZ(R) 400T Photoresist Stripper
Chlorobenzene
Chloroform
Citric Acid
Copper Etch APS-100
Buffered Oxide Etch(BOE)
CR-14 Chromium Etchant
CR-7S Chromium Etchant
CR-100 Chromium Etchant
Cuprous Chloride
Dichloromethane
Dimethyl Sulfoxide
Ethanol, Ethyl Alcohol
Futurrex RR4 Resist Developer
Futurrex RR6 Resist Developer
Hexamethyldisilazane
Hydrofluoric acid
Hydrogen Peroxide
Iron Oxide Mask Etchant ME-10
Isopropyl Alcohol
Methanol
Methyl Isobutyl Ketone (MIBK)
Methylene Chloride
Nickel Etchant
Nitric Acid (50-70%)
Perchloric Acid
Phosphoric acid
Potassium Hydroxide
Sodium Hydroxide
SU-8 Developer
SU-8 Resist
Sulfuric Acid
Tetrahydrofuran
Thionyl Chloride
Tolulene
Trichloroethylene
Triethylene Glycol
Xylenes
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